Electroless Ni/Pd/Au plating process (Displacement Pd type)

Features

Compared to the conventional electroless Ni/Pd/Au (ENEPIG) process, the Pd and Au film thickness are extremely thin.

Extremely stable deposition rate.

Relative Deposition rate (%) = Temporal deposition rate/Initial deposition rate × 100

The newly developed Displacement Pd type plating bath has excellent solution stability while maintaining a high deposition rate.

  • *MTO (Metal Turn Over): The number of times the Pd metal is replenished to compensate for the amount consumed by deposition.

Ensures solderability and wire bondability at the same level as conventional Ni/Au and Ni/Pd/Au.

Main applications

  • IC package substrates
  • LED substrates
  • Printed wiring boards

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